See new SMU module and other advanced physics research technology at APS Summit
See Lake Shore Cryotronics in Booth 549 at APS Global Physics Summit

Lake Shore Cryotronics will be showcasing a first-of-its-kind DC + AC source measure unit module with lock-in detection (SMU-10) and other innovative physics research products at next week’s APS Global Physics Summit in Anaheim, CA.

The SMU-10 is the newest module for the company’s MeasureReady™ M81-SSM synchronous source measure system. It builds on the M81-SSM platform’s ultra-low noise sourcing and measuring technologies, conveniently integrating I/V and DC/AC sourcing and measuring in a single compact module. It provides DC current, DC voltage, AC current, AC voltage, lock-in, and resistance measurement capabilities. 

Offering very low noise measurements with nano-volt and femto-amp precision, the SMU-10 is ideal for characterizing the ultra-low voltage regimes of nanoscale and 2D nanomaterial semiconductors. Plus, it provides increased measurement sensitivity by thermal and offset reduction through AC measurement capabilities, and synchronous/simultaneous sourcing and measuring removes sampling misalignment, making it well-suited for semiconductor I-V testing.

APS attendees who want to see an SMU-10 measurement can visit Lake Shore’s booth. The company will demo a measurement of a sample mounted in a TTPX cryogenic probe station.

Also on display will be:

In addition, representatives will also be answering questions about Lake Shore’s:

  • Wide selection of cryogenic sensors, controllers, and monitors — with Lake Shore offering an early look at its next-generation cryogenic controller in its booth
  • New electromagnet-based MagRS system, with a miniaturized replica of the system on hand showing how the various components work together to allow for VSM, FMR, and Hall effect measurements
  • Full range of cryogenic probe stations for performing on-wafer DC or high-frequency measurements at temperatures as low as 1.6 K and in fields as high as 5 T under vacuum

In addition to the exhibit, Lake Shore will be participating in the APS conference, with the company’s Applications Team presenting on: 

  • "Reducing Common-Mode Artifacts in 2D Material Measurements” at 3:36 p.m. Wednesday (Session MAR-N20), in 254B (Level 2) of the Anaheim Convention Center
  • "Separating Density and Mobility Transients: Frequency-Multiplexed Hall Effect Method” at 9:48 a.m. Friday (Session MAR-W20), also in 254B (Level 2) of the convention center; this presentation relates to research co-authored by Northwestern University and ETH Zurich scientists