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 Cryogenic Probe Stations

   
 Model #
Vacuum
Max # of probe arms
Temperature range
Max sample size
Closed Cycle Refrigerator
Magnet field
Load lock
 CRTTP6-4K
10-5 torr
6
4.5 K to 350 K
50 K to 475 K*
51 mm (2 in) diameter
Yes
NA
NA
 HFTTP4
10-5 torr
4
2 K to 400 K
25 mm (1 in) diameter
NA
1 T horizontal field
NA
 VFTTP4
10-5 torr
4
2 K to 400 K
51 mm (2 in) diameter
NA
2.5 T vertical field
NA
 EMTTP4
10-5 torr
4
10 K to 450 K
25 mm (1 in) diameter
NA
0.55 T horizontal field
NA
 HVTTP6
10-7 torr
6
2 K to 475 K
51 mm (2 in) diameter
NA
NA
NA
 LLTTP6
10-5 torr
6
10 K to 400 K
51 mm (2 in) top load;
12.7 mm (0.5 in) with load-lock
NA
NA
Yes
 FWP6
10-5 torr
6
4.5 K to 475 K
102 mm (4 in) diameter
NA
NA
NA
 TTP6
10-5 torr
6
3.2 K to 475 K
51 mm (2 in) diameter
NA
NA
NA
 TTP4-1.5K
10-5 torr
4
1.5 K to 475 K
25 mm (1 in) diameter
NA
NA
NA
 TTP4
10-5 torr
4
3.2 K to 475 K
51 mm (2 in) diameter
NA
NA
NA
*The above specs include equipment options.
Model CRTTP6-4K (NEW)
Cryogenic Probe Station
CRTTP6-4K Probe Station

 Features

  • Cryogen free 4 K base temperature Sumitomo closed cycle refrigerator
  • Operation from 4.5 K to 350 K
  • Measurements from DC to 67 GHz
  • Up to six micro-manipulated probe arms
  • Up to 51 mm (2 in) diameter wafers
Spacer
Model HFTTP4 Probe Station

 Features

  • 10 kOe (1 T) horizontal field superconducting magnet
  • Operation from 2 K to 400 K
  • Measurements from DC to 67 GHz
  • Up to four micro-manipulated probe arms
  • Up to 25 mm (1 in) diameter wafers
Spacer
Model VFTTP4 Probe Station

 Features

  • 25 kOe (2.5 T) vertical field superconducting magnet
  • Operation from 2 K to 400 K
  • Measurements from DC to 67 GHz
  • Up to four micro-manipulated probe arms
  • Up to 51 mm (2 in) diameter wafers
Spacer
EMTTP4

Features

  • 5.5 kOe (0.55 T) horizontal field electromagnet
  • 360° sample stage rotation option
  • Operation from 5 K to 475 K
  • Measurements from DC to 67 GHz
  • Up to four micro-manipulated probe arms
  • Up to 25 mm (1 in) diameter wafers
Spacer
Model HVTTP6 Probe Station

Features

  • High vacuum - 10-7 torr
  • Operation from 2 K to 475 K
  • Measurements from DC to 67 GHz
  • Up to six micro-manipulated probe arms
  • Up to 51 mm (2 in) diameter wafers
  • In-plane sample stage rotation
Spacer
Model LLTTP6 Probe Station

Features

  • Load-lock sample exchange
  • Operation from 10 K to 400 K
  • Measurements from DC to 67 GHz
  • Up to six micro-manipulated probe arms
  • Top load accommodates up to 51 mm (2 in) diameter wafers; up to 12.7 mm (0.5 in) diameter using load-lock
  • In-plane sample stage rotation
Spacer
Model FWP6 Probe Station

Features

  • Operation from 4.5 K to 475 K
  • Measurements from DC to 67 GHz
  • Up to six micro-manipulated probe arms
  • Up to 102 mm (4 in) diameter wafers
  • Sample stage with in-plane translation and in-plane rotation
Spacer
Model TTP6 Probe Station

Features

  • Operation from 3.2 K to 475 K
  • Measurements from DC to 67 GHz
  • Up to six micro-manipulated probe arms
  • Up to 51 mm (2 in) diameter wafers
  • In-plane sample stage rotation
Spacer
TTP4-1.5 K Probe Station

 Features

  • Operation from 1.5 K to 475 K
  • Measurements from DC to 67 GHz
  • Up to four micro-manipulated probe arms
  • Up to 25 mm (1 in) diameter wafers
Spacer
Model TTP4 Probe Station

 Features

  • Operation from 3.2 K to 475 K
  • Measurements from DC to 67 GHz
  • Up to four micro-manipulated probe arms
  • Up to 51 mm (2 in) diameter wafers
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